Aerospace and Defense​

TMPI SupportsLeading Research and Manufacturing Facilities World-Wide. From Production Fabs toNano Laboratories, Our Staff Understands Your Needs and Works Closely toSupport All Stages Of Your Program.

Process Monitoring:

·      DI Water Monitoring: Conductivity, Ph, Na-Content, & Bacteria Count

·       WastewaterMonitoring: Metals Analysis Using Flame Atomic Absorption Spectroscopy

·       CleanRoom, Oven Monitoring: Particles, Humidity, Temperature, And Air-Flow

·       ProcessingTanks: Concentration, Accumulation Of Contaminants

·       Monitoring,Ph and Conductivity Measurement, UltraSonic Intensity

·       CleanlinessMonitoring: Al, SST, And Ceramic Coupons

Typical Cleanliness:

·      Volatile Residues (Outgassing): < 50 Ng/Cm^2Typical : 3ng/Cm^2

·       Non-VolatileResidue: < 1milligram/M^2 : 0.1mg/Ft^2

·       Particles:IEST-STD-CC1246D Level 50